Microstructural Properties of Laser Ablated Ba05Sr05TiO3 Ferroelectric Films
Abstract
The microstructural and ferroelectric properties of bulk Ba1-x SrxTiO3 and thin films prepared by excimer pulsed láser deposition on SiO2/c-Si, and Pt/ Ti/SiO2/c-Si are reponed in ibis work. The films were amorphous in the as-deposited condition and randomly crystallized after post-annealing at 550°C. The x-ray diffraction patterns of the films and the ablation target match exactly indicating that excellent stoichiometry preservation is attained by pulsed laser deposition. Smooth and uniform films showing few cracked areas were obtained on SiO2/c-Si substrates. while films deposited on Pt/ Ti/SiO2/c-Si substrates presented wider cracks that were promoted during the annealing process due to the thermal expansión mismatch between the films and the Pt coated substrates. The Curie temperature of the films was around -3l°C with a máximum dielectric constant of 180.